kw.\*:("Carbon fluorides")
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Micro-tribological studies on fluorinated carbon filmsMIYAKE, S; KANEKO, R; KIKUYA, Y et al.Journal of tribology. 1991, Vol 113, Num 2, pp 384-389, issn 0742-4787Article
Fluorographit-ein interessanter Festschmierstoff = Intérêt du fluorographie comme lubrifiant solide = Fluorographite ― an interesting solid lubricantSTEPINA, V.Schmierungstechnik. 1988, Vol 19, Num 4, pp 114-117, issn 0036-6226Article
Dry etching characteristics of (Ba0.6, Sr0.4)TiO3 thin films in high density CF4/Ar plasmaKANG, Pil-Seung; KIM, Kyoung-Tae; KIM, Dong-Pyo et al.Surface & coatings technology. 2003, Vol 171, Num 1-3, pp 273-279, issn 0257-8972, 7 p.Article
Mass spectrometric studies of ionic products in CF4/He and CF4/O2/He microwave discharge plasmasIWASE, Keiichiro; SELVIN, P. Christopher; SATO, Gen et al.Journal of physics. D, Applied physics (Print). 2002, Vol 35, Num 16, pp 1934-1938, issn 0022-3727, 5 p.Article
Plasma and plasma-frequency method of usefulness components extracting from ore minerals and concentrates : extracting of fluorine as carbon fluorides from fluoriteTUMANOV, Y. N; KONONOV, S. V; GALKIN, A. F et al.Fizika i himiâ obrabotki materialov. 1999, Num 5, pp 40-48, issn 0015-3214Article
Plasma-enhanced fluorination of carbon materialsMOGUET, F; SHIRASAKI, T; TRESSAUD, A et al.Le Vide (1995). 1997, Vol 53, Num 284, pp 101-104, issn 1266-0167, SUPConference Paper
Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistryOH, C. H; LEE, N.-E; KIM, J. H et al.Surface & coatings technology. 2003, Vol 171, Num 1-3, pp 267-272, issn 0257-8972, 6 p.Article
Mass spectrometric measurements in inductively coupled CF4/Ar plasmasRAO, M. V. V. S; SHARMA, S. P; MEYYAPPAN, M et al.Plasma sources science & technology (Print). 2002, Vol 11, Num 4, pp 397-406, issn 0963-0252, 10 p.Article
Mechanism of highly selective SiO2 contact hole etchingMATSUI, Miyako; TATSUMI, Tetsuya; SEKINE, Makoto et al.Plasma sources science & technology (Print). 2002, Vol 11, Num 3A, pp A202-A205, issn 0963-0252Article
The Te versus pL characteristic in electronegative gases with more than one species of negative ionFRANKLIN, R. N.Journal of physics. D, Applied physics (Print). 2002, Vol 35, Num 8, pp 747-750, issn 0022-3727, 4 p.Article
SEM study of fluorocarbon films by R.F. sputtering PTFE targets on PET substratesQI, H. J; FU, Y. B; WANG, D et al.Surface & coatings technology. 2000, Vol 131, Num 1-3, pp 177-180, issn 0257-8972Conference Paper
Graphite fluoride prepared at mild temperature for high energy/high power density lithium batteriesYAZAMI, R; HANY, P; MASSET, P et al.Molecular crystals and liquid crystals science and technology. Section A, Molecular crystals and liquid crystals. 1998, Vol 310, pp 397-402, issn 1058-725XConference Paper
Structural characterization of intercalated C2Fxcompounds using XAFS polarization dependenciesBAUSK, N. V; ERENBURG, S. B; YUDANOV, N. F et al.Journal de physique. IV. 1997, Vol 7, Num 2, pp C2.1167-C2.1168, issn 1155-4339, 2Conference Paper
High aspect ratio via etching conditions for deep trench of siliconPARK, W. J; KIM, J. H; CHO, S. M et al.Surface & coatings technology. 2003, Vol 171, Num 1-3, pp 290-295, issn 0257-8972, 6 p.Article
Innovative plasma diagnostics and control of process in reactive low-temperature plasmasKLICK, M; KAMMEYER, M; REHAK, W et al.Surface & coatings technology. 1998, Vol 98, Num 1-3, pp 1395-1399, issn 0257-8972Conference Paper
Synthesis, characterization, and rheological behavior of polyethylene glycols end-capped with fluorocarbon hydrophobesXU, B; LI, L; YEKTA, A et al.Langmuir. 1997, Vol 13, Num 9, pp 2447-2456, issn 0743-7463Article
New design of a plasma chamber for homogeneous web treatmentLEIBER, J; SELAFF, O; STEFFENS, F et al.Surface & coatings technology. 1995, Vol 74-75, Num 1-3, pp 49-54, issn 0257-8972, 1Conference Paper
Development of high energy density small flat spiral cells and battery pack based on lithium/carbon monofluoride (Li/CFx)EWEKA, E. I; GIWA, C. O; MEPSTED, G. O et al.Journal of power sources. 2006, Vol 162, Num 2, pp 841-846, issn 0378-7753, 6 p.Conference Paper
Fragment-ion variations in a pulsed plasmaSAKUDO, N; KOMATSU, K; MORI, T et al.Surface & coatings technology. 2003, Vol 169-70, pp 72-75, issn 0257-8972, 4 p.Conference Paper
Deposition of super-hydrophobic fluorocarbon coatings in modulated RF glow dischargesFAVIA, P; CICALA, G; MILELLA, A et al.Surface & coatings technology. 2003, Vol 169-70, pp 609-612, issn 0257-8972, 4 p.Conference Paper
Operational impedance of an Li-CFx cellBEKETAEVA, L. A; RYBALKA, K. V; FATEEV, S. A et al.Russian journal of electrochemistry. 2001, Vol 37, Num 9, pp 994-996, issn 1023-1935Article
Measurement analysis of radio frezquency glow discharge electrical impedance and network power lossBUTTERBAUGH, J. W; BASTON, L. D; SAWIN, H. H et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1990, Vol 8, Num 2, pp 916-923, issn 0734-2101Article
Comparison of the tribological properties of fluorinated cokes and graphitesFUSARO, R. L.Tribology transactions. 1989, Vol 32, Num 2, pp 121-132, issn 1040-2004, 12 p.Conference Paper
The effect of 1,2-dimethoxyethane on the storage and performance of lithium cells with MnO2 and (CF)n cathodesFRACKOWIAK, E; KUKSENKO, S.Journal of power sources. 1998, Vol 72, Num 2, pp 174-177, issn 0378-7753Article
State-of-charge measurement of the lithium-carbon monofluoride battery by chronopotentiometrySANDIFER, J. R.Journal of applied electrochemistry. 1986, Vol 16, Num 2, pp 307-308, issn 0021-891XArticle